QUANTUM LITHO

RESIST

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E-BEAM RESIST (Customized orders available)

PMMA950K Anisole,Chlorobenzen (2 ~10 Solid contens)

PMMA450K Anisole,Chlorobenzen (2 ~10 Solid contens)

MMA A,C

PMGI

QLP-520(ZEP520 Comparable, High sensitivit:10~40uC/cm2, etch-resistance

QLN-240 (MA-N Comparble, High sensitivity(1~10uC/cm2), residue free.

QLN-NiO2-1000 NiO2 Metal oxide resist

QLN-TiO2-1000 TiO2 Metal oxide resist

PHOTO RESIST Commercial launch planned for Q1 2027

QLN-8000 (SU-8 Comparable)

QLP-1500 (AZ Resist Comparable)

DEVELOPER

QLD-950K ( 1D, 2D, 3D) - Developer for PMMA, MMA

QLD-600 - Developer for QLN-8000, SU-8, QLN-240

QLD-610 - Developer for QLP-1500, AZ Series resist