› QUANTUM LITHO > EQUIPMENT
통합 검색
통합 검색
EQUIPMENT
E-beam Lithography
E-Beam Lithography System
Quantum Writer ®
20Mhz, 5Mhz
16bit DAC
CAD EDIT ( GDSII, DXF, DWG)
Beam Blanker
Position Adjustable
50~80 nS Beam On/Off
Suitable with Raith, NPGS and Others
Manual On/Off Optional
Nano Stage
Precison Stitching, Overlay
5nm resolution
<100nm repeatabiity with Marker
20x20mm, 40x40mm, 100x100mm
USED SYSTEM
RAITH ELPHY QUANTUM, ELPHY PLUS, NPGS, DEBEN BEAM BLANKER, Contact us for a consultation.
ELPHY PLUS
2.6Mhz
16bit DAC
CAD EDIT ( GDSII, DXF, DWG)
SEM, FIB Attachment System
ELPHY QUANTUM
2.6Mhz , 6 Mhz
16bit DAC
CAD EDIT ( GDSII, DXF, DWG)
SEM, FIB Attachment System
DEBEN BEAM BLANKER
PCD Beam Blanker
Automated positioning
JEOL, HITACHI SEM
<80 ~ 100nS Blanking speed